CHA 1000 Evaporator System
THE SE-SERIES HIGH-VACUUM DEPOSITION SYSTEMS
The SE-Series high-vacuum deposition systems and pumping stations are designed for use in production or research environments. There are a complete line of options and accessories means you’re certain of a system precisely matched to your application and your capital-equipment budget. With the SE-Series, you get a fully automatic operation.
You can use any type of commercially available source—including single and multiple electron beam sources, magnetron sputtering sources, resistance sources, ion-beam sources, and RF induction sources. And you can select from a wide variety of heaters and other process instrumentation.
For extended flexibility, SE-Series systems can be equipped with various fixturing, such as lift-off, flip-type, single-dome, planetary, or custom. In addition to the 19- or 25.5-inch diameters, stainless steel bell jars can be supplied in other sizes to meet individual requirements.
Whatever the configuration, each evaporator system reflects the simplicity of design, quality construction, and easy operation that add up to overall efficiency—an efficiency apparent in fast cycle time, maximum wafer capacity, convenient reloading and servicing, and long system life.
SUPERIOR DESIGN
The Belljar Series deposition systems incorporate a number of design features that make them unlike any other system available. They’re valuable features that guarantee higher quality in the finished product while making operation—as well as equipment servicing—easy and economical.
LARGE ROUGHING LINE FOR FAST PUMPDOWN
The 3-inch block manifold roughing and foreline valves in CHA deposition systems speed pumpdown and boost gas-handling capacity. And—as in the high-vacuum valve—both valves use a vertical sealing plane to prevent leaks caused by falling particles.
HIGH-VOLUME COLD TRAP
Over 250 inches of cryogenic surface in each SE-Series cold trap allows handling of high volumes of condensable vapor. The trap is designed to conserve liquid nitrogen, and a typical holding time of 10 to 14 hours means a process cycle needn’t be interrupted for trap refilling.
SEC SYSTEMS…CRYOGENIC PUMPING
Because it offers superior cleanliness and high pumping speed—particularly for water vapor—cryogenic pumping is preferred in some applications. Where this is the case, SEC-1000, SEC-600 and SEC-400 deposition systems answer the need by incorporating cryo pumps—with automatic regeneration capabilities where desired—in addition to the standard mechanical roughing pump.
The combination of the cryo pump and second-phase cryo panel typically results in pumpdown to the 10⁻⁷ torr range in less than 10 minutes under production conditions measured in the chamber.
SE-SERIES OPTIONS
Simple PLC Pumpdown Controller
Offering a simple PLC allows you to have automatic pumpdown and vent with interlocks. All of the deposition is controlled by your choice of deposition rate controller. The controller can also control cryo regeneration. By simplifying the controller you save in cost.
Fully Auto PLC Package
Offering this package allows you to have one touch operation. The PLC can control the pumpdown, venting, cryo regen, and the deposition process. Simple make recipe and hit start.
Water-Cooled Bell Jar
This option provides water cooling of the bell jar when high heat is used in extended evaporation cycles.
Other Valuable Options
• Dual-ion gauge readout
• RGA port
• Substrate heating
• Heater power supplies
• Deposition power supplies
• Shutter and shutter controls
• Automatic gun rotation control
The SE-1000
The largest of the SE-Series, the SE-1000 has a 10-inch cryo pump, and is typically equipped with a 25.5-inch, water-cooled bell jar and a 26-inch diameter stainless steel baseplate.
With planetary fixturing holding up to 574-inch wafers and an average air-to-air cycle time of 20 minutes, the SE-1000 can process up to 175 wafers per hour. One button control and dual ion gauges are among the most popular options added to the system.
The SE-600
The SE-600’s 6-inch, cryo pumped system. Like all SE-Series systems, the baseplate (20 or 26 inches) accommodates up to 20 feedthroughs for instrumentation, control, and rotary motion. SE-600 systems are typically equipped with a 19.5-inch bell jar and planetary fixturing having a capacity of 184-inch wafers. The average cycle time of 20 minutes allows throughput in excess of 54 wafers per hour. Simple and full PLC can be used.
The SE-400
Intended primarily for small production applications and laboratory use, the SE-400 incorporates a 4-inch, cryo pumped. Though many SE-400s are operated with a simple PLC, the system can be equipped with the full range of options, including one-button controls.
Reach out for support or inquiries anytime.
Contact
hours
sales@sputteringneeds.com
1-510-252-9900
Veteran owned and operated
© 2026. All rights reserved.
Monday - Friday
7:00am - 3:00 pm
