CPA 9900                                             CPA V2000                                 CPA H3000

                   

                               

                  CPA 9900 W/ETCH                    CPA W/OEM CONTROLLER      CPA 9900 PLC CONTROLLER

CPA 9900 Series Horizontal Sputtering Systems are designed for a variety of short-run to medium production applications.  

                                                                                                                                                                                                                                                                                                                                                                                                                             CPA 9930 Series can be variously configured as required with diffusion or cryo high vacuum pumping.CPA H3000 Series Magnetron                   Drive @ 12 Kw, Controlled with customer connection ports: 17 or 37 pin conn,208V, 3 Ph, 50/60 Hz.

 

CPA V2000 Series Systems are modular, they can be configured to fit the process; systems can have as many different process                 chambers, substrate heaters or sputter etch chambers as desired.    

 

        

 

 

Physical Vapor Deposition PVD coating technology – DC Magnetron sputtering, RF sputtering, Electron Beam Evaporation or
Thermal Evaporation Systems – there is probably a more advanced CPA version that is tested, proven and will give you more for
your money.